By on October 27, 2017

We Propose

Customizable etchable mask for flat or curved surfaces
Feature sizes down to 70nm, wavelengths from 200nm – 1600nm, various shapes, sizes and depths
Resolution of electron-beam lithography (70- 500nm) but affordable and fast

Patterns created in two dimensions, including:

  • Straight Lines
  • Chirped (variable line spacing)
  • Circles or Dots
  • Concentric Circles
  • Ovals
  • Polygons


  • Patterns Formed In: PVA, PMMA, PDMS, Fused Silica, Glass, Sapphire
  • Pattern: Arbitrary 2D patterns: Lines with variable spacing within pattern, Squares, Circles or Dots, Concentric Circles, Ovals, Polygons
  • Surface Type: Curved Optic or Lens, Wafer, Mirror, Fiber ends
  • Feature Size: Down to 70nm line widths or features
  • Feature Spacing: Down to 300nm between lines or features
  • Feature Depth: Up to 1.5 micron
  • Aspect Ratio: > 3 to 1
  • Grating Profile: Blazed Sawtooth and Triangle, Lamellar (rectangular)
  • Grating Type: Transmission or Reflection
  • Wavelengths: 200nm to 1600nm
  • Diffraction Efficiency: >90% (wavelength dependent)